发明名称 |
SEMICONDUCTOR WAFER MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor wafer manufacturing method which can easily form an orientation flat line and perform beveling without any difficulty.SOLUTION: A manufacturing method of a semiconductor wafer 12 according to the present embodiment is a manufacturing method of a semiconductor wafer of cutting a plurality of small-diameter wafers 12 from a large-diameter semiconductor wafer 10 and comprises: a marking process of collectively forming a straight groove-like orientation flat line 16 every row by laser beams in a manner such that cutting positions of the small-diameter wafers line in a particular direction and each orientation flat line 16 traverses the small-diameter wafers 12 in each row in the large-diameter semiconductor wafer 10; and a cutting process of individually cutting the small-diameter wafers 12 from the large-diameter semiconductor wafer 10 by the laser beams after the marking process. |
申请公布号 |
JP2014110411(A) |
申请公布日期 |
2014.06.12 |
申请号 |
JP20120265687 |
申请日期 |
2012.12.04 |
申请人 |
FUJIKOSHI MACH CORP;NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY |
发明人 |
NAKAMURA YOSHIO;ICHIKAWA TAIZO;SUMIZAWA HARUO;HARA SHIRO;KUMPUAN SOMAWANG;IKEDA SHINICHI |
分类号 |
H01L21/304;B23K26/00;B23K26/38 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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