发明名称 SEMICONDUCTOR WAFER MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor wafer manufacturing method which can easily form an orientation flat line and perform beveling without any difficulty.SOLUTION: A manufacturing method of a semiconductor wafer 12 according to the present embodiment is a manufacturing method of a semiconductor wafer of cutting a plurality of small-diameter wafers 12 from a large-diameter semiconductor wafer 10 and comprises: a marking process of collectively forming a straight groove-like orientation flat line 16 every row by laser beams in a manner such that cutting positions of the small-diameter wafers line in a particular direction and each orientation flat line 16 traverses the small-diameter wafers 12 in each row in the large-diameter semiconductor wafer 10; and a cutting process of individually cutting the small-diameter wafers 12 from the large-diameter semiconductor wafer 10 by the laser beams after the marking process.
申请公布号 JP2014110411(A) 申请公布日期 2014.06.12
申请号 JP20120265687 申请日期 2012.12.04
申请人 FUJIKOSHI MACH CORP;NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 NAKAMURA YOSHIO;ICHIKAWA TAIZO;SUMIZAWA HARUO;HARA SHIRO;KUMPUAN SOMAWANG;IKEDA SHINICHI
分类号 H01L21/304;B23K26/00;B23K26/38 主分类号 H01L21/304
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