| 摘要 |
PROBLEM TO BE SOLVED: To improve the flatness of a substrate main surface after surface treatment with an easy method.SOLUTION: The invention relates to a method in which a process liquid T is dropped on a main surface of a substrate W from a process liquid drop nozzle 81 while the substrate W is rotated being horizontally held on a rotation stage 71 and surface treatment is performed on the entire main surface of the substrate W. The substrate W is pre-heated by a substrate temperature control mechanism 6 before the process liquid T is dropped and a temperature of the main surface of the substrate W is controlled to a predetermined temperature. |
