| 发明名称 |
PELLICLE FOR RETICLE AND MULTILAYER MIRROR |
| 摘要 |
A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer. |
| 申请公布号 |
US2014160455(A1) |
申请公布日期 |
2014.06.12 |
| 申请号 |
US201414181076 |
申请日期 |
2014.02.14 |
| 申请人 |
YAKUNIN Andrei Mikhailovich;Banine Vadim Yevgenyevich;Loopstra Erik Roelof;Ven Der Schoot Harmen Klaas;Stevens Lucas Henricus Johannes;Van Kampen Maarten |
发明人 |
YAKUNIN Andrei Mikhailovich;Banine Vadim Yevgenyevich;Loopstra Erik Roelof;Ven Der Schoot Harmen Klaas;Stevens Lucas Henricus Johannes;Van Kampen Maarten |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
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| 主权项 |
1. A pellicle constructed and arranged for an EUV reticle, the pellicle comprising graphene.
|
| 地址 |
Eindhoven NL |
