发明名称 |
VACUUM HEATING FURNACE AND MANUFACTURING METHOD OF ORGANIC SEMICONDUCTOR ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum heating furnace capable of efficiently heating and cooling plural substrates.SOLUTION: A vacuum heating furnace A heats plural substrates S in a vacuum. The vacuum heating furnace A includes: a heating space 1 for heating plural substrates S in a vacuum; and a cooling space 2 for cooling the heated plural substrates S in a vacuum. The vacuum heating furnace A includes: a support member 3 capable of holding plural substrates S disposed generally parallel to each other, and moving between the heating space 1 and the cooling space 2 in a direction perpendicular to the surface of the plural substrates S; and a cooling member 4 forming the cooling space 2, which is cooled by a cooling source. The cooling member 4 has a radiation structure 5 for cooling the plural substrates S by means of radiation. |
申请公布号 |
JP2014110294(A) |
申请公布日期 |
2014.06.12 |
申请号 |
JP20120263283 |
申请日期 |
2012.11.30 |
申请人 |
PANASONIC CORP |
发明人 |
KUZUOKA YOSHIKAZU;MIYAGAWA NOBUYUKI |
分类号 |
H01L21/324;H01L51/50;H05B33/10 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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