| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a drawing device advantageous for reducing variation in line width incident to error diffusion.SOLUTION: A lithography device for drawing on a substrate with an energy beam, based on a bit map data generated from pattern data via error diffusion, includes smoothing means S502 for smoothing the pattern data before error diffusion. Gray level bit map data, subjected to correction processing S501, is smoothed by means of a lowpass filter, and since the change of pixel values is moderated at the boundary of a pattern by the smoothing, the errors that cannot be compensated can be reduced when compensating the errors diffused.</p> |
