发明名称 NEAR-INFRARED-VISIBLE LIGHT ADJUSTABLE IMAGE SENSOR
摘要 The disclosure belongs to the field of semiconductor photoreceptors, in particular to a near-infrared-visible light adjustable image sensor. By adding a transfer transistor, the disclosure integrates a silicon-based photoelectric diode and a silicon germanium-based photoelectric diode on the same chip to realize that the silicon-based photoelectric diode and a silicon germanium-based photoelectric diode are controlled by the same readout circuit at different time, thus widening the spectrum response scope of the photoreceptor, realizing high integration and multifunction of the chip and reducing the manufacturing cost of the chip. The disclosure is applicable for intermediate and high-end products with low power consumption and photoreceptors for specific wave bands, in particular to military, communicative and other special fields.
申请公布号 US2014159129(A1) 申请公布日期 2014.06.12
申请号 US201313920696 申请日期 2013.06.18
申请人 Fudan University 发明人 Wang Pengfei;Liu Xinyan;Sun Qingqing;Zhang Wei
分类号 H01L27/146 主分类号 H01L27/146
代理机构 代理人
主权项 1. A near-infrared-visible light adjustable image sensor, comprising: a p-type doped silicon substrate; a silicon-based photoelectric diode formed on side silicon substrate; a silicon germanium-based photoelectric diode formed on side silicon substrate; a first transistor and a second transistor formed in said silicon substrate and between said silicon-based photoelectric diode and said silicon germanium-based photoelectric diode; and a conductive floating node formed on said silicon substrate and between said first and second transistors and serving as a charge storage node.
地址 Shanghai CN