| 发明名称 |
PROCESS FOR PREPARING NANOPARTICLE EMBEDDED ELECTRONIC DEVICE |
| 摘要 |
The present invention relates to a process for preparing an electronic device comprising at least one layer selected from the group consisting of a upper electrode layer, a lower electrode layer, an organic layer and an inorganic layer, which comprises a step of introducing a nanoparticle layer or a nano/micro structure layer by adhering charged nanoparticles, before, after or during forming the layer. |
| 申请公布号 |
US2014159030(A1) |
申请公布日期 |
2014.06.12 |
| 申请号 |
US201314233813 |
申请日期 |
2013.03.04 |
| 申请人 |
Global Frontier Center for Multiscale Energy System ;SNU R&DB Foundation |
发明人 |
Kim Changsoon;Kim Hyungchae;Lee Jongcheon;Han Kyuhee;Sung Hyangki;Jung Kinam;Choi Hoseop;Ha Kyungyeon;Choi Man Soo |
| 分类号 |
H01L51/50;H01L51/56;H01L21/326 |
主分类号 |
H01L51/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A process for preparing an electronic device comprising at least one layer selected from the group consisting of a upper electrode layer, a lower electrode layer, an active layer, an organic layer and an inorganic layer,
which comprises the step of introducing a nanoparticle layer or a nano or micro structure layer by adhering charged nanoparticles in the form of aerosol, before, after or during the step of forming the layer.
|
| 地址 |
Seoul KR |
