发明名称 Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements
摘要 A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
申请公布号 US2014158902(A1) 申请公布日期 2014.06.12
申请号 US201414165573 申请日期 2014.01.27
申请人 Applied Materials Israel, Ltd. ;Carl Zeiss Microscopy GmbH 发明人 Knippelmeyer Rainer;Kienzle Oliver;Kemen Thomas;Mueller Heiko;Uhlemann Stephan;Haider Maximilian;Casares Antonio;Rogers Steven
分类号 H01J37/30;H01J37/317;H01J37/10 主分类号 H01J37/30
代理机构 代理人
主权项
地址 Rehovot IL