发明名称 |
Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements |
摘要 |
A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity. |
申请公布号 |
US2014158902(A1) |
申请公布日期 |
2014.06.12 |
申请号 |
US201414165573 |
申请日期 |
2014.01.27 |
申请人 |
Applied Materials Israel, Ltd. ;Carl Zeiss Microscopy GmbH |
发明人 |
Knippelmeyer Rainer;Kienzle Oliver;Kemen Thomas;Mueller Heiko;Uhlemann Stephan;Haider Maximilian;Casares Antonio;Rogers Steven |
分类号 |
H01J37/30;H01J37/317;H01J37/10 |
主分类号 |
H01J37/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
Rehovot IL |