发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR QUANTUM DOT, AND SINGLE PHOTON GENERATOR AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor quantum dot, and a single photon generator and a method of manufacturing the same, capable of achieving both high light-emitting efficiency and position controllability of a semiconductor quantum dot.SOLUTION: In a rectangular recessed part formed on a surface of a semiconductor substrate having a (100) plane as a principal surface, a lower clad layer having a recess consisting of an inclined plane whose angle made with the (100) plane is gentler than 54.7° is formed. A quantum dot layer is formed in this recess.
申请公布号 JP2014110274(A) 申请公布日期 2014.06.12
申请号 JP20120262770 申请日期 2012.11.30
申请人 FUJITSU LTD 发明人 UETAKE MASATO
分类号 H01S5/34 主分类号 H01S5/34
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