EXPOSURE DEVICE AND METHOD FOR FORMING FINE PATTERNS, AND APPARATUS AND METHOD OF MANUFACTURING POLARIZING FILM USING THE SAME

摘要

The present invention discloses an exposure device and method for forming a fine pattern and an apparatus and a method for manufacturing a polarizing film including the same, respectively. The exposure device for forming a fine pattern according to the present invention includes a laser beam light source; a shutter that has a pin hole through which laser beam emitted from the laser beam light source passes; a convex lens that is provided between the laser beam light source and the shutter and collects the laser beam so that the laser beam passes through the pin hole; a collimating lens that is provided in front of the shutter, and collimates the laser beam which passes through the pin hole to emit a collimated beam; a beam splitter that is provided in front of the collimating lens, and splits the collimated beam into first and second split beams; first and second mirrors that respectively reflect the first and second split beams to form first and second reflection beams; and a Talbot prism into which the first and second reflection beams are respectively injected to discharge an interference beam.