| 摘要 |
PROBLEM TO BE SOLVED: To provide a new and improved barrier film which allows the occurrence of pin holes and cracks to be reduced and has improved gas barrier properties; and the manufacturing method thereof.SOLUTION: In an aspect of the present invention, the barrier film includes: a plurality of cured layers formed by curing a photocurable precursor which contains polysilazane; an uncured layer disposed between the cured layers, which contains a precursor; and a gradient composition layer disposed between the cured layer and the uncured layer, of which the precursor concentration in the inner region increases with the distance from the cured layer to each of the inner regions. |
