发明名称 |
CONTACT LANDING PADS FOR A SEMICONDUCTOR DEVICE AND METHODS OF MAKING SAME |
摘要 |
One device herein includes first and second spaced-apart active regions, a transistor formed in and above the first active region, wherein the transistor has a gate electrode, a conductive contact landing pad that is coupled to the second active region, wherein the contact landing pad is made of the same conductive material as the gate electrode, and a contact that is coupled to the contact landing pad. One method herein includes forming first and second spaced-apart active regions, forming a layer of gate insulation material on the active regions, performing an etching process to remove the gate insulation material formed on the second active region, performing a common process operation to form a gate electrode structure above the gate insulation material on the first active region and the contact landing pad that is conductively coupled to the second active region and forming a contact to the contact landing pad. |
申请公布号 |
US2014159125(A1) |
申请公布日期 |
2014.06.12 |
申请号 |
US201213710575 |
申请日期 |
2012.12.11 |
申请人 |
GLOBALFOUNDRIES INC. |
发明人 |
Jakubowski Frank;Faul Juergen |
分类号 |
H01L29/417;H01L29/40 |
主分类号 |
H01L29/417 |
代理机构 |
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代理人 |
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主权项 |
1. A device, comprising:
first and second spaced-apart active regions formed in a semiconducting substrate; a transistor formed in and above said first active region, said transistor comprising a gate electrode made of a conductive material; a conductive contact landing pad that is conductively coupled to said second active region, wherein said conductive contact landing pad is made of the same conductive material as said gate electrode; and a contact that is conductively coupled to said conductive contact landing pad.
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地址 |
Grand Cayman KY |