发明名称 |
SEMICONDUCTOR DEVICE PROCESSING TOOLS AND METHODS FOR PATTERNING SUBSTRATES |
摘要 |
In some embodiments, an electronic device processing system is provided that includes a processing tool having a first subsystem configured to carry out a first subset of processes on a substrate having pattern features, the first subsystem including a first conformal deposition chamber and a first etch chamber. The processing tool includes a second subsystem coupled to the first subsystem and configured to carry out a second subset of processes on the substrate, the second subsystem including a second conformal deposition chamber and a second etch chamber. The processing tool is configured to employ the first and second subsystems to perform pitch division on the substrate within the processing tool so as to form a reduced-pitch pattern on the substrate. Numerous other embodiments are provided. |
申请公布号 |
WO2014088918(A1) |
申请公布日期 |
2014.06.12 |
申请号 |
WO2013US72533 |
申请日期 |
2013.12.01 |
申请人 |
APPLIED MATERIALS, INC |
发明人 |
TRIVEDI, MAYUR;PADIYAR, SUSHIL;KARUPPIAH, LAKSHMANAN;THAKUR, RANDHIR |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|