MANUFACTURING METHOD OF DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a display device including a TFT using an oxide semiconductor capable of ensuring the uniformity and the reliability of TFT characteristics.SOLUTION: The manufacturing method of a display device includes the steps of: forming a gate electrode on a substrate; forming a gate insulating film; forming an oxide semiconductor; forming a source electrode and a drain electrode; forming a passivation film; forming a common electrode; forming an interlayer insulating film; forming a pixel electrode; forming an alignment layer; irradiating an ultraviolet ray onto the oxide semiconductor; and performing heat treatment on the oxide semiconductor which has been irradiated with the ultraviolet ray. The ultraviolet ray irradiating step is performed after the oxide semiconductor forming step; and the heat treatment step is performed after the passivation film forming step.