| 摘要 |
PROBLEM TO BE SOLVED: To enable scrub cleaning to be performed on a cleaned surface of a wafer in a spinner table and prevent rear surface contamination caused by contaminants coming around to a rear surface of the wafer.SOLUTION: An outer periphery holding means 20 comprises: a liquid reservoir part 21 which stores a liquid on an upper surface 21a and forms a liquid layer 6; a liquid supply port 22 which supplies the liquid to the upper surface 21a of the liquid reservoir part 21; and a lifting part 23 which selectively positions the liquid reservoir part 21 between an action position P1 and a non action position P2. Thus, when the wafer W is cleaned, the liquid reservoir part 21 is positioned at the action position P1, and an upper surface 7 of the liquid layer 6 formed at the liquid reservoir part 21 is located at a level equivalent to an upper surface 3 of the spinner table 2. Then, the liquid layer 6 holds an outer peripheral part Wc of the wafer W, and a surface Wa of the wafer W is cleaned by cleaning means 10. Further, a rear surface Wb of the wafer W is sealed by the liquid layer 6. The structure prevents contaminants from coming around to the rear surface Wb and reduces rear surface contamination of the wafer W. |
