| 摘要 |
PROBLEM TO BE SOLVED: To provide an evaporation source for vapor deposition apparatuses which enables preventing deficiencies due to adhesion of an evaporated vapor deposition material to a heat reflection plate.SOLUTION: An evaporation source 1 for vapor deposition apparatuses comprises a cylindrical crucible 4 containing a vapor deposition material 2, heaters 5a and 5b heating the vapor deposition material 2 to a temperature evaporating the vapor deposition material 2 and a body part 6 housing the crucible 4 and the heaters 5a and 5b. The crucible 4 includes a bottom part 4a in which the vapor deposition material 2 is arranged, an opening part 4b formed so as to be face the bottom part 4a, a side wall 4c connecting the bottom part 4a to the opening part 4b and a constricted part 4d formed in the side wall 4c in the vicinity of the opening part 4b. There is also provided with a heat reflection plate 7a arranged in the side surface of the constricted part 4d in such a way as to be separated from the opening part 4b and having a hole part 7b of an aperture smaller than the largest diameter Lof the constricted part 4d. The configuration prevents deficiencies due to adhesion of the evaporated vapor deposition material 2 to the heat reflection plate 7a in the evaporation source 1 for vapor deposition apparatuses. |
