发明名称 |
METHOD OF MANUFACTURING SEMICONDUCTOR WAFERS |
摘要 |
<p>A method for manufacturing a semiconductor wafer of the present invention is a method for manufacturing a semiconductor wafer which discharges a plurality of wafers with a small-diameter from the semiconductor wafer with a large-diameter. The method comprises: a marking process for collectively forming straight groove-like orientation flat lines for each column by a laser light by disposing discharging positions of the small-diameter wafers in a row to a specific direction on the large-diameter semiconductor wafer and by crossing each of the small-diameter wafers in each row; and a discharging process for individually discharging the small-diameter wafers from the large-diameter semiconductor wafer by the laser light after the marking process.</p> |
申请公布号 |
KR20140071930(A) |
申请公布日期 |
2014.06.12 |
申请号 |
KR20130149731 |
申请日期 |
2013.12.04 |
申请人 |
FUJIKOSHI MACHINERY CORPORATION;NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY |
发明人 |
NAKAMURA YOSHIO;ICHIKAWA DAIZO;SUMIZAWA HARUO;HARA SHIRO;KHUMPUANG SOMMAWAN;IKEDA SHINICHI |
分类号 |
H01L21/78 |
主分类号 |
H01L21/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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