发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR WAFERS
摘要 <p>A method for manufacturing a semiconductor wafer of the present invention is a method for manufacturing a semiconductor wafer which discharges a plurality of wafers with a small-diameter from the semiconductor wafer with a large-diameter. The method comprises: a marking process for collectively forming straight groove-like orientation flat lines for each column by a laser light by disposing discharging positions of the small-diameter wafers in a row to a specific direction on the large-diameter semiconductor wafer and by crossing each of the small-diameter wafers in each row; and a discharging process for individually discharging the small-diameter wafers from the large-diameter semiconductor wafer by the laser light after the marking process.</p>
申请公布号 KR20140071930(A) 申请公布日期 2014.06.12
申请号 KR20130149731 申请日期 2013.12.04
申请人 FUJIKOSHI MACHINERY CORPORATION;NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY 发明人 NAKAMURA YOSHIO;ICHIKAWA DAIZO;SUMIZAWA HARUO;HARA SHIRO;KHUMPUANG SOMMAWAN;IKEDA SHINICHI
分类号 H01L21/78 主分类号 H01L21/78
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