| 摘要 |
PROBLEM TO BE SOLVED: To provide a conditioning method for an electron gun capable of effectively suppressing an abnormal discharge of the electron gun, and provide an electron beam lithography system. SOLUTION: The conditioning method for an electron gun applies a voltage between an anode and an Wehnelt of an electron gun to cause a discharge on their surfaces, the electron gun comprising: a cathode for emitting electrons by heating; a Wehnelt for applying a bias voltage to the cathode; and an anode for applying an acceleration voltage to the cathode and converging electrons emitted from the cathode to form an electron beam. Voltage application between the anode and the Wehnelt is performed varying the voltage periodically within a range not exceeding a predetermined value after increasing the voltage to the predetermined value. Application of periodically varied voltage is stopped after the stop of discharge is checked and a predetermined time passes. COPYRIGHT: (C)2012,JPO&INPIT |
