发明名称 |
METHOD OF MAKING DELAMINATION RESISTANT ASSEMBLIES |
摘要 |
The present application is directed to a method of reducing delamination in an assembly. The method comprises providing an assembly and limiting visible light exposure to parts of the assembly to maintain a peel force of 20 grams/inch or greater where the light is limited. The assembly comprises an electronic device, a substrate having a first surface and a second surface opposite the first surface, wherein the second surface of the substrate is disposed on the electronic device, a barrier stack disposed on the first surface of the substrate, and a weatherable sheet adjacent the barrier film opposite the substrate. The assembly is transmissive to visible and infrared light. |
申请公布号 |
EP2740147(A1) |
申请公布日期 |
2014.06.11 |
申请号 |
EP20120819486 |
申请日期 |
2012.07.24 |
申请人 |
3M INNOVATIVE PROPERTIES COMPANY |
发明人 |
WEIGEL, MARK, D.;RUFF, ANDREW, T.;BERNIARD, TRACIE, J. |
分类号 |
H01L21/00;H01L31/048 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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