发明名称 |
THIN FILM TRANSISTOR SUBSTRATE FOR IN-PLANE SWITCHING DISPLAY HAIVING HIGH APERTURE RATIO AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<p>The present invention relates to a thin film transistor substrate used for an in-plane switching display device having high-transmittance and a manufacturing method thereof. According to the present invention, the thin film transistor substrate includes a substrate; a gate wire and a data wire which interpose a gate insulation film therebetween and are crossed by each other to define a pixel area; a common wire which is arranged in parallel with the gate wire; a thin film transistor which includes a gate electrode branched from the gate wire, a source electrode branched from the data wire, and a drain electrode opposed to the source electrode; a first sub-capacity electrode extended from the drain electrode; a protection film which covers the thin film transistor and the first sub-capacity electrode; and a second sub-capacity electrode which interpose protection film between the first sub-capacity electrode and the second sub-capacity electrode, and is overlapped by the first sub-capacity electrode.</p> |
申请公布号 |
KR20140070855(A) |
申请公布日期 |
2014.06.11 |
申请号 |
KR20120136149 |
申请日期 |
2012.11.28 |
申请人 |
LG DISPLAY CO., LTD. |
发明人 |
HEO, SEUNG HO;SO, BYEONG SEONG;CHO, YOUNG SUNG |
分类号 |
G02F1/136;G02F1/1368;H01L29/786 |
主分类号 |
G02F1/136 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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