发明名称
摘要 PURPOSE: A deposition apparatus is provided to reduce the danger of malfunction and damage of an evaporation source by preventing the climbing of aluminum and the inflow of aluminum vapor. CONSTITUTION: An evaporation source unit(26) is included within a vacuum chamber. The evaporation source unit comprises a crucible(1), a nozzle(2), a heater chamber(10), and a fixture(7). The crucible accepts evaporation material(5). The nozzle is installed at opening of the crucible. The heater chamber surrounds the crucible. The heater chamber accepts a heater(3). The nozzle comprises a secondary heater. The nozzle is heated over the melting point of an evaporation source.
申请公布号 JP5520871(B2) 申请公布日期 2014.06.11
申请号 JP20110079947 申请日期 2011.03.31
申请人 发明人
分类号 C23C14/24;H01L51/50;H05B33/10 主分类号 C23C14/24
代理机构 代理人
主权项
地址