发明名称 Device for batch treatment
摘要 The invention relates to the batch treatment of goods with gas, steam or vapor, for example sterilization and drying. The distribution of the medium surrounding the load (8) during all stages of such a process is important. According to the invention, movement of fluids within a batch treatment apparatus is achieved using a fluid ejector device (9), An apparatus for the gas, steam or vapor treatment of objects is provided, said apparatus having inside a closable chamber (1) at least one ejector device (9) of the type having a straight flow path for the secondary stream. Any particular fluid or mixture of different fluids entering the chamber during a treatment process may be introduced via an ejector device (9) in order to distribute the fluid around the load (8), or remove material deposited on the load (8). The invention eliminates the need for shaft seal arrangements involved with fans.
申请公布号 US8747772(B2) 申请公布日期 2014.06.10
申请号 US20070448117 申请日期 2007.12.13
申请人 Steris Europe, Inc. Suomen Sivuliike 发明人 Nurminen Teppo;Laitinen Ilkka
分类号 A61L9/00;B01J7/00;A61L2/00 主分类号 A61L9/00
代理机构 代理人
主权项 1. A device for treating batches of objects with gas, steam or vapor, the device comprising a closable chamber for containing said objects and at least one ejector device for generating a secondary gas stream within the chamber by means of a primary gas stream, the at least one ejector device having no moving parts for generating the secondary gas stream, the at least one ejector device located within said chamber and the at least one ejector device including: a secondary flow channel having an inlet and an outlet in said chamber for drawing a secondary gas from said chamber and exhausting said secondary gas back into said chamber to generate said secondary gas stream within said chamber wherein the secondary gas flows through the at least one ejector device in an essentially straight line, and a second inlet fluidly connecting the secondary flow channel to a source of pressurized primary gas wherein the primary gas draws the secondary gas into the at least one ejector device through said inlet of said secondary flow channel.
地址 Tuusula FI