发明名称 Manufacturing apparatus
摘要 The purpose of the invention is increasing the efficiency of utilizing an EL material and providing a deposition method and a vapor deposition apparatus which is one of the film formation systems which are excellent in throughput and uniformity in film thickness in forming an EL layer. According to the invention, evaporation is performed by moving or reciprocating an evaporation source holder in which a plurality of containers (crucible) each encapsulating an evaporation material are set only in an X direction while moving a substrate at regular intervals. Further, in the plurality of evaporation source holders, film thickness meters of adjacent evaporation sources are disposed alternately so as to sandwich the movement pathway of the substrate.
申请公布号 US8747558(B2) 申请公布日期 2014.06.10
申请号 US20070723574 申请日期 2007.03.21
申请人 Semiconductor Energy Laboratory Co., Ltd. 发明人 Sakata Junichiro;Yamazaki Shunpei
分类号 C23C16/00 主分类号 C23C16/00
代理机构 代理人
主权项 1. A manufacturing apparatus comprising: a film formation chamber comprising a first evaporation source and a second evaporation source, each of the first evaporation source and the second evaporation source comprising a first crucible and a second crucible, wherein the first evaporation source and the second evaporation source are arranged to move in an X direction, wherein at least one of the first evaporation source and the second evaporation source is arranged to move in a Z direction, wherein a substrate is arranged to move in a Y direction, wherein the first evaporation source and the second evaporation source are adjacent, and wherein film thickness meters of the first evaporation source and the second evaporation source are disposed alternately so as to sandwich a movement of the substrate.
地址 Kanagawa-ken JP