发明名称 SOI switch enhancement
摘要 The described FET switch topology greatly reduces the off state loading experienced by the gate biasing resistors in a stacked FET structure. The FET switch topology evenly distributes the voltage across the FET switch topology which reduces the voltage across the gate biasing resistors when the stacked FET structure is in an off state. Because the off state loading is reduced, there is a corresponding reduction of the current through bias resistors, which permits a reduction in the size of the bias resistors. This permits a substantial reduction in the area attributed to the bias resistors in an integrated solution.
申请公布号 US8749296(B2) 申请公布日期 2014.06.10
申请号 US201313892992 申请日期 2013.05.13
申请人 RF Micro Devices, Inc. 发明人 Granger-Jones Marcus
分类号 H03K17/687 主分类号 H03K17/687
代理机构 代理人
主权项 1. A serially stacked shunt semiconductor on insulator (SOI) switch comprising: a plurality of field effect transistor (FET) devices, wherein each FET device of the plurality of FET devices includes a gate contact, a drain contact, and a source contact, and such that the plurality of FET devices are coupled in series to form a chain having a first drain at a first end of the chain, a first source coupled to a second end of the chain, and wherein the gate contact of the FET device at the second end of the chain is a first gate contact; a plurality of gate biasing circuits coupled in series, wherein each one of the plurality of gate biasing circuits is coupled between a corresponding pair of gate contacts of the plurality of FET devices, and further wherein each one of the plurality of gate biasing circuits includes a resistor; and a plurality of gate speedup circuits, wherein each one of the plurality of gate speedup circuits is coupled across a corresponding gate biasing circuit of the plurality of gate biasing circuits.
地址 Greensboro NC US