| 摘要 |
The present invention relates to a photomask. The photomask according to one embodiment of the present invention includes a transparent substrate with a light transmission unit for focusing light and a pattern unit which is formed on the transparent substrate. The photomask of the present invention can easily form fine photomask patterns. The light transmission unit is formed on the transparent substrate which is exposed between pattern units. The pattern units include at least one among a light blocking pattern, a light semi-transmission pattern, or a phase inversion pattern. |
