发明名称 |
Precursor for formation of europium-containing thin film, and method for forming europium-containing thin film |
摘要 |
Provided are a novel europium compound which has a melting point of 180° C. or lower and can be stably supplied by bubbling in a chemical vapor deposition method or an atomic layer deposition method, a precursor for forming a europium-containing thin film based on the compound, and a method for forming a europium-containing thin film using this precursor. A europium-containing thin film is formed using bis(tetramethylmonoalkylcyclopentadienyl)europium as a precursor for forming a europium-containing thin film by a chemical vapor deposition method or anatomic layer deposition method. |
申请公布号 |
US8747965(B2) |
申请公布日期 |
2014.06.10 |
申请号 |
US201214007474 |
申请日期 |
2012.02.23 |
申请人 |
Kabushikikaisha Kojundokagaku Kenkyusho |
发明人 |
Mogi Takayuki;Kuboshima Yoshinori;Higashi Shintaro;Kikukawa Kaoru |
分类号 |
B05D3/06;C23C18/00;C23C18/14;C23C20/00 |
主分类号 |
B05D3/06 |
代理机构 |
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代理人 |
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主权项 |
1. Bis(tetramethylmonoalkylcyclopentadienyl)europium represented by formula:
Eu[C5(CH3)4R]2 (wherein R represents an alkyl group having 2 or more carbon atoms).
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地址 |
Sakado-shi JP |