发明名称 Diamine compound and production method thereof
摘要 The present invention provides a novel diamine compound represented by formula (1) below. A in formula (1) denotes an optionally-substituted divalent aliphatic group (having a carbon number of 10 or less) or an optionally-substituted divalent aromatic group (having the number of rings of 4 or less), for example. The diamine compound of the present invention can be used as a raw material or a crosslinking agent for polyamide, polyimide, polyurethane, epoxy resin, etc.;
申请公布号 US8748664(B2) 申请公布日期 2014.06.10
申请号 US201113579168 申请日期 2011.02.24
申请人 Nitto Denko Corporation 发明人 Sugitani Tooru
分类号 C07C213/00 主分类号 C07C213/00
代理机构 代理人
主权项 1. A method for producing the diamine compound represented by formula (1) below,the method comprising steps of: obtaining a compound (B) represented by formula (4) belowby a condensation reaction between 2,7-dihydroxy-9-fluorenone represented by formula (2) and a compound (A) represented by formula (3), obtaining a compound (C) represented by formula (5) below by reducing a ketone group at the 9-position in a fluorene skeleton of the compound (B) to a state where a hydroxy group is bonded to a carbon atom at the 9-position, and thereafter acetylating the hydroxy group, obtaining a diamine compound represented by the formula (1) by reducing the carbon atom at the 9-position, to which the acetoxy group is bonded, in the fluorene skeleton of the compound (C), and reducing nitro groups included in the compound (A)-derived substituents that are bonded to carbon atoms at the 2-position and the 7-position in the skeleton, wherein X in formula (3) denotes a halogen group, and A in formulae (1) and from (3) to (5) denotes: a divalent aliphatic group R1, which may have a substituent and has a carbon number from 1 to 10;a divalent aromatic group Ar1, which has from 1 to 4 ring structures and may have a substituent;a group composed of divalent aromatic groups Ar2 and Ar3, each of which has from 1 to 4 ring structures and may have a substituent, the group being represented by a formula [—Ar2—Ar3—] (where Ar2 and Ar3 may be same as or different from each other);a group composed of divalent aromatic groups Ar4 and Ar5, each of which has from 1 to 4 ring structures and may have a substituent, and Z, which is an ether group (—O—), a thioether group (—S—), or a sulfone group (—SO2—), the group being represented by a formula [—Ar4—Z—Ar5-] (where Ar4 and Ar5 may be same as or different from each other);a group composed of a divalent aromatic group Ar6, which has from 1 to 4 ring structures and may have a substituent, and a divalent aliphatic group R2, which may have a substituent and has a carbon number from 1 to 10, the group being represented by a formula [—Ar6—R2—]; ora group composed of divalent aromatic groups Ar7 and Ar8, each of which has from 1 to 4 ring structures and may have a substituent, and a divalent aliphatic group R3, which may have a substituent and has a carbon number from 1 to 10, the group being represented by a formula [—Ar7—R3—Ar8—] (where Ar7 and Ar8 may be same as or different from each other),wherein the substituent is at least one group selected from a methyl group, an ethyl group, a propyl group, a butyl group, a trifluoromethyl group, a phenyl group, a phenoxy group, a phenylthio group, and a benzenesulfonyl group.
地址 Osaka JP