| 摘要 |
A gas supply unit of an ion beam source includes a chamber which is combined with an ion beam generation unit and includes an inner space connected to gas supply holes of the ion beam generation unit, a gas supply tube which passes through the chamber outside the chamber and supplies gas to the inner space of the chamber, and a gas distribution plate which covers the gas supply holes in the inner space of the chamber and uniformly supplies the gas from the inner space to the gas supply holes. The gas supply unit uniformly supplies the gas to the ion beam generation unit. Thereby, the ion beam source uniformly generates an ion beam. |
