Lithographic apparatus and device manufacturing method

摘要

A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.

主权项

1. A radiation source system, comprising:
a droplet generator configured to generate droplets of a fuel liquid; a laser configured to produce a laser beam, the laser arranged to direct the laser beam to hit the droplets generated by the droplet generator at an ignition location to produce radiation; a source chamber in which the ignition location is located, the source chamber having an inner wall with an aperture to pass the radiation out of the source chamber; a pumping system configured to pump away gas; an outlet connected to the pumping system and the source chamber, the outlet located at or near the aperture and located outside the inner wall; and a suppression flow system configured to provide a gas flow in a direction toward the ignition location to help prevent contamination particles from passing through the aperture in the direction of the radiation, the suppression flow system comprising an inlet opening to supply gas for the gas flow, the inlet opening being between the inner wall and the outlet.