Device and method for forming low-temperature polysilicon film

摘要

Provided is a forming device and method making it possible to obtain a low-temperature polysilicon film in which the size of crystal grains fluctuates minimally, and is uniform. A mask has laser-light-blocking areas and laser-light-transmission areas arranged in the form of a grid such that the light-blocking areas and transmission areas are not adjacent to one another. Laser light is directed by the microlenses through the masks to planned channel-area-formation areas. The laser light transmitted by the transmission areas is directed onto an a-Si:H film, annealing and polycrystallizing the irradiated parts thereof. The mask is then removed, and when the entire planned channel-area-formation area is irradiated with laser light, the already-polycrystallized area, having a higher melting point, does not melt, while the area in an amorphous state melts and solidifies, leading to polycrystallization. The grain size of the polysilicon film obtained is regulated by the light-blocking areas and transmission areas and is thus controlled to a predetermined range.

主权项

1. A device for forming a low-temperature polysilicon film comprising:
a plurality of microlenses arranged one-dimensionally or two-dimensionally; a laser-light-generating source; a light guide section for guiding laser light from the laser-light-generating source to said microlenses so as to condense said laser light onto an amorphous silicon film by said microlenses; and a plurality of, masks, each of the masks being arranged for each of the microlenses, and each including a plurality of transmission areas for transmitting said laser light and a plurality of light-blocking areas for blocking said laser light in a two-dimensional arrangement on said masks, wherein said transmission areas and said light-blocking areas are disposed alternatingly in one direction and an other direction crossing said one direction, such that the transmission areas are not adjacent to one another and the light-blocking areas are not adjacent to one another, and wherein the masks are disposed between the light guide section and the microlenses.