发明名称 Methods of generating patterned soft substrates and uses thereof
摘要 The present invention provides methods of generating and devices of patterned soft substrates, on which cells may be seeded, as well as methods of using these substrates. Devices containing these patterned soft substrates are also provided.
申请公布号 US8748181(B2) 申请公布日期 2014.06.10
申请号 US20090994187 申请日期 2009.05.22
申请人 President and Fellows of Harvard College 发明人 Kuo Po-Ling;Feinberg Adam W.;Parker Kevin Kit
分类号 A61K35/34;C12N5/07;C12N5/00 主分类号 A61K35/34
代理机构 代理人
主权项 1. A method for generating a patterned soft substrate, the method comprising providing a base layer; depositing a sacrificial polymer on the base layer, thereby generating a sacrificial polymer layer; depositing a photoresist onto the sacrificial polymer layer, thereby generating a photoresist layer; placing a mask comprising a pattern on top of the photoresist layer and exposing the photoresist layer to electromagnetic radiation, thereby generating a patterned photoresist complementary mask comprising the complement of the pattern of the mask; releasing the patterned photoresist complementary mask from the sacrificial polymer layer; placing the patterned photoresist complementary mask onto a soft substrate such that the patterned photoresist complementary mask makes conformal contact with the soft substrate; and functionalizing the portion of the soft substrate that is exposed by the pattern in the patterned photoresist complementary mask by depositing a linker molecule and a biopolymer onto the soft substrate, wherein the linker molecule associates with the biopolymer and the soft substrate to attach the biopolymer to the portion of the soft substrate exposed by the pattern; thereby generating the patterned soft substrate.
地址 Cambridge MA US
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