EXPOSURE APPARATUS, METHOD OF CONTROLLING EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of suppressing occurrence of an exposure failure.SOLUTION: The exposure apparatus exposes a substrate to exposure light via a liquid. The exposure apparatus includes: an optical member having an emission surface from which the exposure light is emitted; a liquid immersion member which is arranged on at least part of the periphery of an optical path of the exposure light emitted from the emission surface and has a lower surface; a holding mechanism which releasably holds a first cover member so that an upper surface of the first cover member at least partially faces the emission surface and the lower surface, in a second process different from a first process including exposure of the substrate; and a movable member which has a holding part for releasably holding the substrate and is movable relative to the holding mechanism. In the second process, a second cover member different from the first cover member is arranged on the holding part of the movable member while the first cover member is held by the holding mechanism.