发明名称 METHOD FOR PRODUCING SOLID STATE IMAGING ELEMENT
摘要 <p>The solid-state imaging device in which pixel electrodes, a photoelectric conversion portion having an organic film generating electric charge in response to incident light, a transparent counter electrode, and a sealing layer are formed on a substrate is produced by the method including causing a metal mask to come into close contact with a substrate surface, on which the pixel electrodes are disposed, by magnetic force; forming the organic film by vapor-depositing an organic substance to the substrate surface on which the pixel electrodes are disposed; removing the metal mask after the organic film is formed; forming the counter electrode on the organic film; and forming the sealing layer covering the counter electrode, wherein the metal mask has undergone half etching to have a half etching portion and comes into close contact with the substrate surface such that a lower surface of the half etching portion faces the pixel electrodes.</p>
申请公布号 KR20140068987(A) 申请公布日期 2014.06.09
申请号 KR20147007169 申请日期 2012.07.12
申请人 FUJIFILM CORPORATION 发明人 NAKATANI TOSHIHIRO
分类号 H01L27/146 主分类号 H01L27/146
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