发明名称 OBIRCH INSPECTION METHOD AND OBIRCH DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an OBIRCH inspection method and an OBIRCH device capable of detecting a point where a defect occurs with higher sensitivity than the conventional method.SOLUTION: At first, an inspected object 30 is mounted on the sample stage 11 of an OBIRCH device. A reflective plate 35 is arranged on the first side of the inspected object 30. Subsequently, a probe pin 12a is brought into contact with the inspected object 30. Thereafter, the second side of the inspected object 30 is irradiated with laser light, while applying a voltage via the probe pin 12a, and a current flowing through the probe pin 12a is detected.
申请公布号 JP2014107483(A) 申请公布日期 2014.06.09
申请号 JP20120260974 申请日期 2012.11.29
申请人 FUJITSU SEMICONDUCTOR LTD 发明人 FURUYA HITOSHI
分类号 H01L21/66;G01R31/02 主分类号 H01L21/66
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