| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a reflective mask for forming a light-shielding frame on an outer circumference of a circuit pattern on a surface of a reflective mask to be used for semiconductor lithography, the surface where the circuit pattern is formed, by which the light-shielding frame having light-shielding property can be formed through an easy process without requiring etching or processing of an absorption layer and a multilayer reflection layer and without causing damages or changes in optical properties of the layers.SOLUTION: A light-shielding frame 10 to be formed in a reflective mask is formed by using photolithographic techniques using a photosensitive resin material on a surface of the mask where a circuit pattern is formed. |
