SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a salt to be used for a resist composition from which a negative resist pattern with excellent resolution and/or CD uniformity (CDU) can be produced.SOLUTION: The salt is expressed by formula (I). In formula (I), Qand Qeach independently represent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms; Lrepresents a divalent saturated hydrocarbon group having 1 to 17 carbon atoms, in which a methylene group included in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group, and a hydrogen atom included in the saturated hydrocarbon group may be replaced by a fluorine atom; Rand Reach independently represent an aliphatic hydrocarbon group having 1 to 6 carbon atoms, or Rand Rare bonded to each other together with a carbon atom bonded to both to form a ring having 5 to 20 carbon atoms; the aliphatic hydrocarbon group and the ring may have a substituent; and Zrepresents an organic cation.