ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in an exposure latitude (EL) and line width roughness (LWR) and excellent in release property of a space pattern on a stepped substrate, which is particularly suitable for a method of forming a negative pattern by organic solvent development, and more particularly, which is suitable for KrF exposure, and to provide a pattern forming method, a resist film, a method for manufacturing an electronic device, and an electronic device using the above composition.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition comprises a resin (A) which includes an aromatic group and (i) a repeating unit having a group that is decomposed by an action of an acid to generate a polar group, and which may include (ii) a repeating unit having a polar group other than a phenolic hydroxyl group. The total of the repeating units (i) and (ii) is 51 mol% or more with respect to the whole repeating units in the resin (A).