发明名称 SUBSTRATE MANUFACTURING METHOD AND APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate manufacturing method hardly generating a difference in level on a surface of a thin film.SOLUTION: A nozzle unit for ejecting liquid droplets of a thin film material from a plurality of nozzle holes is opposed to a substrate and relatively moved to the substrate, and the liquid droplets of the a thin film material is discharged onto the substrate so that a plurality of edge patterns are formed on a surface of the substrate along the edge of a plurality of patterns to be formed. A thin film is formed in a solid region by discharging the liquid droplets of the thin film material on the solid region surrounded by the edge pattern while the nozzle unit is relatively moved in a first position with respect to the substrate. In the process of forming the thin film in the solid region, the thin film is formed in a condition that the edge of the thin film formed while the nozzle unit is relatively moved in one direction with respect to the substrate does not pass through the inside of the solid region.
申请公布号 JP2014104385(A) 申请公布日期 2014.06.09
申请号 JP20120257401 申请日期 2012.11.26
申请人 SUMITOMO HEAVY IND LTD 发明人 OKAMOTO YUJI
分类号 B05D1/26;B05C5/00;B05D7/00;H05K3/00;H05K3/28 主分类号 B05D1/26
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