| 摘要 |
<p>The method produces a photoelectric conversion element comprising a lower electrode, an electron blocking layer, a photoelectric conversion layer, an upper electrode, and a sealing layer which are laminated on one another in this order. The method includes a step of forming a transparent conductive oxide into a film at a deposition rate of 0.5Å/s or higher by a sputtering method to form the upper electrode having a stress of−50 MPa to−500 MPa on the photoelectric conversion layer.</p> |
