发明名称 CERAMIC CYLINDRICAL SPUTTERING TARGET AND METHOD FOR PRODUCING SAME
摘要 The present invention provides a ceramic cylindrical sputtering target characterized in being a single article having a length of 500 mm or longer and a relative density of 95% or greater. The ceramic cylindrical sputtering target is a single article having a high density and length of 500 mm or longer and therefore eliminates the need to use a stack of multiple sputtering targets in order to obtain a long target. Consequently, when the ceramic cylindrical sputtering target of the present invention is used in a magnetron rotary cathode sputtering target, and the like, there are no or few partitions in the target as a whole and therefore there is little arcing and particle generation during sputtering.
申请公布号 KR20140069146(A) 申请公布日期 2014.06.09
申请号 KR20147009792 申请日期 2013.01.11
申请人 MITSUI MINING & SMELTING CO., LTD. 发明人 MASAKI TAKANORI;ISHIDA SHINTARO
分类号 C23C14/34;C04B35/00;C04B35/632 主分类号 C23C14/34
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