发明名称 |
CERAMIC CYLINDRICAL SPUTTERING TARGET AND METHOD FOR PRODUCING SAME |
摘要 |
The present invention provides a ceramic cylindrical sputtering target characterized in being a single article having a length of 500 mm or longer and a relative density of 95% or greater. The ceramic cylindrical sputtering target is a single article having a high density and length of 500 mm or longer and therefore eliminates the need to use a stack of multiple sputtering targets in order to obtain a long target. Consequently, when the ceramic cylindrical sputtering target of the present invention is used in a magnetron rotary cathode sputtering target, and the like, there are no or few partitions in the target as a whole and therefore there is little arcing and particle generation during sputtering. |
申请公布号 |
KR20140069146(A) |
申请公布日期 |
2014.06.09 |
申请号 |
KR20147009792 |
申请日期 |
2013.01.11 |
申请人 |
MITSUI MINING & SMELTING CO., LTD. |
发明人 |
MASAKI TAKANORI;ISHIDA SHINTARO |
分类号 |
C23C14/34;C04B35/00;C04B35/632 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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