| 摘要 |
The present invention relates to an apparatus for processing a strip shaped substrate (1), particularly for coating the strip shaped substrate, in a process chamber (2) by using a process roll (3) supported to be able to rotate around a rotating shaft (18) in the process chamber (2), whereby the substrate (1) unwound from a first spool (6) is spirally supported at an outer surface of the process roll (3) to be processed continuously, particularly to be coated and the processed or coated substrate is wound around a second spool (7). To coat the strip shaped substrate with a graphene layer or a nanotube layer in a continuous pass process, a gas introducing/discharging device (8, 9, 10) is suggested to form a gas flow oriented parallel to the rotating shaft (18) in principle. Further, the present invention relates to a method for coating the strip shaped substrate (1) in the apparatus for processing the strip shaped substrate. |
