METHOD OF FABRICATING ZINC OXIDE BASED THIN FILM FOR TRANSPARENT ELECTRODE
摘要
The present invention relates to a method for fabricating a zinc oxide-based thin film for a transparent electrode and, more particularly, to a method for fabricating a zinc oxide-based thin film for a transparent electrode by depositing a zinc oxide-based thin film on a substrate, which improves surface flatness of a zinc oxide-based thin film at the time of vapor depositing a zinc oxide-based thin film The present invention is characterized in that a zinc source gas and an oxidation agent gas are injected wherein two types of oxidation gases are used as the oxidation agent so as to control the surface shape of the oxidized zinc film to be vapor deposited.
申请公布号
KR20140068586(A)
申请公布日期
2014.06.09
申请号
KR20120136261
申请日期
2012.11.28
申请人
SAMSUNG CORNING PRECISION MATERIALS CO., LTD.
发明人
LEE, HYUN HEE;KIM, SEO HYUN;YOON, GUN SANG;PARK, JUNE HYONG;BAEK, IL HEE;YOO, YOUNG ZO;LEE, JOO YUNG;CHOI, EUN HO