| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and apparatus for photoimaging.SOLUTION: Specifically, there is provided a method and apparatus for photoimaging a substrate covered with a wet curable photopolymer. The photoimaged substrate is used to form images, such as electrical circuits or other features used e.g. in a photochemical machining industry (PCMI) such as lines, squares. spirals, circles or other geometrical and nongeometrical figures. |
