发明名称 |
OXIDE SEMICONDUCTOR ELEMENT, METHOD FOR MANUFACTURING OXIDE SEMICONDUCTOR ELEMENT, DISPLAY DEVICE, AND IMAGE SENSOR |
摘要 |
PROBLEM TO BE SOLVED: To secure operation stability during light irradiation, and to enhance a protection function of an oxide semiconductor layer while suppressing a manufacturing cost.SOLUTION: An oxide semiconductor element 10 comprises: an electrode composed of a metallic material of any of electrodes 14, 20, and 22; an oxide semiconductor layer 18 including at least one selected from In, Zn, Ga, and Sn; and a protective layer 24 laminated in the oxide semiconductor layer 18 and composed of an inorganic insulating layer 26 and the same metallic material as the electrodes. |
申请公布号 |
JP2014107453(A) |
申请公布日期 |
2014.06.09 |
申请号 |
JP20120260201 |
申请日期 |
2012.11.28 |
申请人 |
FUJIFILM CORP |
发明人 |
MOCHIZUKI FUMIHIKO;ISODA TOMOTAKE;TANAKA ATSUSHI;SUZUKI MASAYUKI |
分类号 |
H01L29/786;H01L21/336;H01L27/146;H01L51/50 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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