发明名称 OXIDE SEMICONDUCTOR ELEMENT, METHOD FOR MANUFACTURING OXIDE SEMICONDUCTOR ELEMENT, DISPLAY DEVICE, AND IMAGE SENSOR
摘要 PROBLEM TO BE SOLVED: To secure operation stability during light irradiation, and to enhance a protection function of an oxide semiconductor layer while suppressing a manufacturing cost.SOLUTION: An oxide semiconductor element 10 comprises: an electrode composed of a metallic material of any of electrodes 14, 20, and 22; an oxide semiconductor layer 18 including at least one selected from In, Zn, Ga, and Sn; and a protective layer 24 laminated in the oxide semiconductor layer 18 and composed of an inorganic insulating layer 26 and the same metallic material as the electrodes.
申请公布号 JP2014107453(A) 申请公布日期 2014.06.09
申请号 JP20120260201 申请日期 2012.11.28
申请人 FUJIFILM CORP 发明人 MOCHIZUKI FUMIHIKO;ISODA TOMOTAKE;TANAKA ATSUSHI;SUZUKI MASAYUKI
分类号 H01L29/786;H01L21/336;H01L27/146;H01L51/50 主分类号 H01L29/786
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