| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask which allows for more accurate management of the amount of displacement of a pixel pattern shrunk from a reference position, and to provide a manufacturing method therefor, and a semiconductor device.SOLUTION: A mask MSK comprises: a substrate SB; an effective pixel formation region; and a reference pattern formation region. In the effective pixel formation region, a pixel pattern PTN1m for forming pixel components is arranged. In the reference pattern formation region, reference patterns PTN21m-PTN28m indicating a reference position, where the pixel pattern PTN1m is arranged originally in the effective pixel formation region, is arranged. The pixel pattern PTN1m is arranged so as to be shifted closer to the center side of the effective pixel formation region than the reference position. |
