| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus in which maintenance of a circulation filter due to fragments of a coating can be facilitated.SOLUTION: Upon finishing the peeling, circulation filters 53, 55 are cleaned by feeding pure water adversely from a pure water supply source 47 to the circulation filters 53, 55. Since fragments of a photoresist coating adhering to the circulation filters 53, 55 can be removed by simply feeding pure water adversely to the circulation filters 53, 55, maintenance of the circulation filters 53, 55 due to fragments of the photoresist coating can be facilitated. When not cleaning the circulation filters 53, 55 after being clogged, but cleaning the filters periodically, adverse effect due to clogging of the circulation filters 53, 55 can be prevented. |
