| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photomask yielding a greater focus margin at the time of exposure.SOLUTION: The provided photomask for manufacturing a display device is a photomask for manufacturing a display device including a pattern for transfer and having the following characteristics: the pattern for transfer includes: a main pattern consisting of a translucent portion and having a diameter of 4 μm or less; and an auxiliary pattern consisting of a translucent portion having a width not resolved by exposure and configured on the peripheries of the main pattern; virtually no phase difference exists between an exposure beam transmitted through the main pattern and an exposure beam transmitted through the auxiliary pattern; in a case where the distance between the center of the main pattern and the center of the width of the auxiliary pattern is defined as a pitch P (μm), the pitch P is set so as to induce the entry, into the optical system of an exposure machine used for the exposure, of a ±primary diffraction beam arising as a result of an optical interference attributed to the exposure beam transmitted through the main pattern and the exposure beam transmitted through the auxiliary pattern. |
