发明名称 CLEANING COMPOSITION
摘要 An industrial cleaning composition is provided that includes: (a) from 5 to 50% by volume of an anionic surfactant having a log10P value in the range 5 to 7; (b) from 5 to 50% by volume of a first non-ionic surfactant having a log10P value in the range 0.1 to 3 and having the general formula, R′—(A0)n—OH, wherein R′ is C9 to C20 alkyl, each AO unit is either —OCH2CH2— or —OCH2CH(CH3)—, the molar ratio [—OCH2CH(CH3)—]/[—OCH2CH2—] is in the range up to 8 and n is greater than 6; and (c) from 5 to 50% by volume of a second non-ionic surfactant having a log10P value in the range 0.1 to 3 having the general formula, R′—(OCH2CH2)n—OH wherein R′ is C9 to C20 alkyl, and n is less than 6, each of said volume percentages being with respect to the total volume of (a), (b) and (c). Corresponding cleaners derived therefrom by water dilution are also disclosed.
申请公布号 US2014155311(A1) 申请公布日期 2014.06.05
申请号 US201313871941 申请日期 2013.04.26
申请人 OTI Greentech Group AG 发明人 JAWAHAR Wakhloo;KEASEY Alan;KELLY Caroline
分类号 C11D1/83 主分类号 C11D1/83
代理机构 代理人
主权项 1. An industrial cleaning composition consisting essentially of: (a) from 5 to 50% by volume of an anionic surfactant having a log10P value in the range 5 to 7; (b) from 5 to 50% by volume of a first non-ionic surfactant having a log10P value in the range 0.1 to 3 and having the general formula, R′—(A0)n—OH, wherein R′ is C9 to C20 alkyl, each AO unit is either —OCH2CH2— or —OCH2CH(CH3)—, the molar ratio [—OCH2CH(CH3)—]/[—OCH2CH2—] is in the range up to 8 and n is greater than 6; and c) from 5 to 50% by volume of a second non-ionic surfactant having a log10P value in the range 0.1 to 3 and having the general formula, R′—(OCH2CH2)n—OH, wherein R′ is C9 to C20 alkyl, and n is less than 6,each of said volume percentages being with respect to the total volume of (a), (b) and (c).
地址 Zug CH