发明名称 |
CLEANING COMPOSITION |
摘要 |
An industrial cleaning composition is provided that includes: (a) from 5 to 50% by volume of an anionic surfactant having a log10P value in the range 5 to 7; (b) from 5 to 50% by volume of a first non-ionic surfactant having a log10P value in the range 0.1 to 3 and having the general formula, R′—(A0)n—OH, wherein R′ is C9 to C20 alkyl, each AO unit is either —OCH2CH2— or —OCH2CH(CH3)—, the molar ratio [—OCH2CH(CH3)—]/[—OCH2CH2—] is in the range up to 8 and n is greater than 6; and (c) from 5 to 50% by volume of a second non-ionic surfactant having a log10P value in the range 0.1 to 3 having the general formula, R′—(OCH2CH2)n—OH wherein R′ is C9 to C20 alkyl, and n is less than 6, each of said volume percentages being with respect to the total volume of (a), (b) and (c). Corresponding cleaners derived therefrom by water dilution are also disclosed. |
申请公布号 |
US2014155311(A1) |
申请公布日期 |
2014.06.05 |
申请号 |
US201313871941 |
申请日期 |
2013.04.26 |
申请人 |
OTI Greentech Group AG |
发明人 |
JAWAHAR Wakhloo;KEASEY Alan;KELLY Caroline |
分类号 |
C11D1/83 |
主分类号 |
C11D1/83 |
代理机构 |
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代理人 |
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主权项 |
1. An industrial cleaning composition consisting essentially of:
(a) from 5 to 50% by volume of an anionic surfactant having a log10P value in the range 5 to 7; (b) from 5 to 50% by volume of a first non-ionic surfactant having a log10P value in the range 0.1 to 3 and having the general formula, R′—(A0)n—OH, wherein R′ is C9 to C20 alkyl, each AO unit is either —OCH2CH2— or —OCH2CH(CH3)—, the molar ratio [—OCH2CH(CH3)—]/[—OCH2CH2—] is in the range up to 8 and n is greater than 6; and c) from 5 to 50% by volume of a second non-ionic surfactant having a log10P value in the range 0.1 to 3 and having the general formula, R′—(OCH2CH2)n—OH, wherein R′ is C9 to C20 alkyl, and n is less than 6,each of said volume percentages being with respect to the total volume of (a), (b) and (c).
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地址 |
Zug CH |