| 摘要 |
<p>A resist composition including a base component (A) of which solubility with respect to a developing solution may change by the action of an acid, in which the base component (A) includes a constituent unit (a0) represented by General Formula (a0-1), at least two constituent units (a1) containing the groups of General Formulae (a1-r-1) and (a1-r-2), and a constituent unit (A1) containing a constituent unit (a2), is disclosed. [In Formula (a0-1), Ra^1 is a monovalent substitent, La^1 is O, S or a methylene group, R^1 is a linear chain type or branched chain type hydrocarbon group, or a cyclic hydrocarbon group of C_2_~_20 that may include a substituent. In Formula (a1-r-1) and Ra′^1 and Ra′^2 are H or an alkyl group, Ra′^3 is a hydrocarbon group. In Formula (a1-r-2), Ra′^4 to Ra′^6 is a hydrocarbon group.].</p> |
