COMPOUND SEMICONDUCTOR MANUFACTURING APPARATUS AND WAFER HOLDING BODY

摘要

PROBLEM TO BE SOLVED: To inhibit alteration in the composition in epitaxial growth of a compound semiconductor.SOLUTION: A wafer holding body 30 for holding a wafer W in an MOCVD apparatus comprises: a loading member 40 for loading the wafer W; and a ring-shaped restriction member 50 loaded on the loading member 40, for restricting transfer of the wafer W loaded on the loading member 40. A top face of the loading member 40 has a wafer loading surface for loading the wafer W and a ring loading surface for loading the restriction member 50. The wafer loading surface is formed to project upward from the ring loading surface and has a convex shape where a central part projects from a peripheral part. An arithmetic mean roughness Ra of the wafer loading surface is set at not greater than 0.5μm.